Master's Thesis: Chip-Level Aluminium Electroplating from Ionic Liquids

The Fraunhofer Institute for Electronic Nanosystems ENAS specializes in the development of smart systems – so-called intelligent systems for a wide range of applications. These systems combine electronic components, micro- and nanosensors, and actuators with communication interfaces. Fraunhofer ENAS develops individual components, the technologies for their manufacture, as well as system concepts and system integration technologies, and translates them into practical applications. Fraunhofer ENAS supports customer projects from the initial idea through design, technology development, or implementation using existing technologies, all the way to a tested prototype. We are offering the opportunity for a six-month Master’s Thesis on aluminum electroplating using ionic liquids (ILs), combined with a paid position as a student assistant. A particular focus of this project is on chip-level electrochemical deposition. Be part of change The project aims to investigate the additives using 1-ethyl-3-methylimidazolium and aluminium chloride in a 1.0:1.5 molar ratio. The influence of ethylene glycol (C₂H₆O₂) and polyvinylpyrrolidone (PVP) as electrolyte/additive components will be investigated with respect to the electrochemical behaviour and resulting aluminium deposition. The main objective of the thesis is to investigate and optimize aluminium electroplating on the chip level using the [EMIm]Cl/AlCl₃ ionic-liquid system and to determine how the addition of ethylene glycol and PVP affects the electrochemical deposition process and the quality of the deposited metal layer. The work will include both quantitative electrochemical investigations at the chip level and a qualitative evaluation of the plating behaviour at the beaker level. You will be responsible for the following tasks: Investigation of the influence of ethylene glycol and polyvinylpyrrolidone (PVP) on the electrolyte and electrodeposition process Development and execution of chip-level aluminium electroplating experiments Use of a potentiostat / galvanostat for electrochemical characterization and process development Performing electrochemical measurements such as: Cyclic voltammetry (CV), potential / current-controlled deposition experiments, where appropriate, pulse-plating investigations Investigation of deposition parameters such as potential, current density, deposition time and additive concentration Investigation of the influence of the electrolyte/additives on deposition quality, morphology, uniformity and adhesion Systematic documentation and evaluation of experimental results Preparation of presentations and regular PPT documentation of the experimental work, results and conclusions